Since its inception in 1990, PSK Inc. has been engaged in the production of surface treatment equipment for semiconductor wafers. The company¡¯s representative items include ashing systems, lite etching systems and dry cleaning systems. Notably, in 2007, the maker ranked at the first position in the global asher field in terms of sales volume.
Among the firm¡¯s popular export items is ¡°Integer IV¡± (or ¡°ZIVIS II¡±) dry native oxide cleaning system. A new-generation 300mm dry-cleaning system, the model provides a solution to the disadvantage of the wet cleaning process. It is designed to satisfy the requirements of a semiconductor cleaning process under 65 nanometers.
In comparison with batch type systems, the model offers improved process reproducibility and safety for particles. It has a cassette loadlock that can hold up to 25 wafers and a dual pick up/down robot for increased productivity.
The company is working to export the product to the U.S., Taiwan, Singapore, China and Japan.
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