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SDCVD (Space divided CVD-ALD) is one of the most advanced and promising thin film technologies. Thanks to
its superior film qualities including impurity-free film, excellent step coverage, good uniformity and lower process
temperature, SDCVD is expected to soon replace conventional thin film technologies such as CVD and PVD.
JUSUNG’s development strategy is to advance hardware concepts to meet the requirements of micro device
makers. One of the unique hardware concepts is the singlewafer type, which is suitable for very thin film deposition
and integration with other thin film processes. Another new concept is the semi-batch type, which is
appropriate for thick film deposition and stand-alone processes. JUSUNG’s system guarantees the highest
throughput with excellent film quality.
(1) CYCLONE PLUS™ SystemThe most significant disadvantage of Atomic Layer Deposition (ALD) is low
throughput. To maximize the throughput of ALD, JUSUNG has developed an innovative semi-batch type system
with a five-wafer batch size. In addition, a rotating injector has been developed to cover a larger deposition area.
The technical advantages of rotating injectors are good uniformity of gas distribution, higher deposition rate, and
minimization of valve control.JUSUNG’s CYCLONE PLUSTM system guarantees to deliver the world’s highest
throughput.
(2) EUREKA™ System
JUSUNG has developed EUREKA™, a single wafer system with a unique injector and reactor. The injector is
located in the center of the top lid (the “top injector”), and its structure is very simple compared to the shower
head type. Due to the injector’s small volume, it takes a relatively short time to purge the source and reactant.
The reactor structure is also much simpler than that of the laminar flow type ALD system. Therefore, this single
wafer system guarantees easy maintenance, high reliability and repeatability. Another important advantage
of this system isthat it performs both pure and pseudo ALD processes, while the shower head and laminar
flow types can only perform either the pseudo or pure process.
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