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S&S Tech is a unique manufacturer of blank masks in Korea, an original
film for photo masks before circuit patterning, widely used in lithography
process of producing semiconductors and LCD panels. It has as thin as
several dozen nanometers layers on a quartz substrate of light shielding,
anti-reflective and resist for making patterned photo mask through such
processes as exposure, development, etching, cleaning and inspection.
Thus, blank mask is not only an extremely sophisticated and technologyoriented
component but critical and indispensable in securing high quality
and an increasing success rate of semiconductor producing.
The blank mask’s substrate has transmittance of not less than 85 % @ 200 nm and not less than 90 %
@230~260nm, and light shielding layer has reflectance of ≥ 20 % @ exposed wavelength.
The company the third largest manufacturer of semiconductor blank mask and the second largest in global
FPD blank mask, taking 9% and 22% of global market share, respectively, following Hoya and Ulcoat in Japan,
with 30 years’ oligopolies in the industry.
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