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Silicon Wafer CMP Pad Conditioner

[Silicon Wafer CMP Pad Conditioner]
Since commencing operations in 1975, Ehwa has been leading the local stone and construction markets by supplying high quality diamond tools - proven products - as well as tailor-made tools suited for specific applications.
Backed by long-accumulated experience and know-how, the maker has become an international benchmark for success in the field.
The firm¡¯s bestquality product, the CMP Pad Conditioner, is especially designed for use in dressing poly-urethane based CMP pads. EHWA currently produces pad conditioners by using three methods - BSL (Brazed Single Layer), Electroplating, and NEW BSL type (double metal layer).
The maker¡¯s BSL products provide a very fast removal rate thanks to its chemical bonding of the abrasive grit to a stainless steel body. Electroplated products provide improved flatness and better surface finish.
Of special note, the new BSL type, a newly developed method, has a double metal layer - the first layer can provide excellent diamond retention and the other layer can provide a clean surface that minimizes micro-scratches.
The company currently leads the way in applying the most advanced technology for manufacturing industrial diamond tools to provide the best possible solutions for its valued customers¡¯ needs, continuously innovating its existing major items.
520-2, Won-dong, Osan-si, Gyeonggi-do, Korea
E-mail: shheo@ehwadia.com
Tel: (82-31) 370-9290
Fax: (82-31)370-9229
 
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