|
Jusung is Korea’s largest process technology solutions provider for semiconductors, flat panel displays, solar, OLED and LED lighting. After the company’s foundation in 1995, Jusung Engineering introduced Korea’s first semiconductor equipment and continued to be recognized as the global supplier with the global standard state-of-the-art technology.
With its proprietary technology, Jusung released large area display equipment in 2002 and solar cell equipment in 2006, and it successfully diversified its business sectors.
The company is working toward fulfilling its dream of becoming the world’s best total equipment manufacturing company in the solar cell, semiconductor and display industries, and is committed to meeting the long-term needs of its customers.
Jusung Engineering’s flagship business areas are as follows:
FPD Equipment
[ PE CVD(Plasma Enhanced Chemical Vapor Deposition) Equipment ]
The PECVD system which is the core process of TFT-LCD is used to deposit SiNx, a-Si:H and n+a-Si layers, and a passivation layer to form TFTs. The company has developed a gas jet system, plasma generation and reaction system, vacuum reactor, heat source, precision processing, and glass transfer system in accordance with the trend of larger PECVD systems, and are offering the combined technologies and systems to its customers to enhance their competitive power. The integrated process technology is recognized worldwide and by the Korean government as one of the world’s most innovative technologies.
Solar Cell Equipment
[ Thin Film(TF) Solar Cell(a-SI/uc-Si) Equipment ]
On the basis of its technical power and experiences in supplying large area thin film deposition equipment for major LCD makers, JUSUNG Engineering has developed technology for thin film silicon solar cell equipment and has supplied them on a turnkey basis. Moreover, JUSUNG is exerting its R&D efforts to develop new materials, new cell structures, cell integration processes, new plasma technology, and a high efficiency deposition system for TF solar cells with higher efficiency.
In the mean time, JUSUNG is the only turnkey supplier of TF solar cell equipment in Korea, with the advantages of tandem solar cells, lower production costs, easy mass production, and high conversion efficiency.
[ Crystalline Silicon Solar Cells(c-Si Solar Cell) Equipment ]
Different from TF solar cells, c-Si solar cells are produced from silicon wafers used to produce semiconductors. Since first launching in the 1960s, c-Si solar cells have been verified in mass production applications. Because they are easier to implement and relatively highly efficient, c-Si solar cells share about 85% of the global solar cell market.
JUSUNG has successfully utilized its expertise in the preprocessing of semiconductors, plasma technology and large-area LCD equipment to develop an innovative c-Si solar cell process line with high process efficiency at a low cost.
The RIE system for surface texturing and the PE CVD system for junction formation and arc deposition, are the core components of a c-Si solar cell process line.
LED Equipment
[ GaN(Gallium Nitride) MOCVD Equipment ]
These days, LED lamps are almost everywhere around us, in cellular phones, traffic signals, and instrument panels, just to name a few applications. Compared with fluorescent lamps, LED lamps are eco-friendly, as they don’t use mercury, have a fast response time and higher energy efficiency, as well as a long life span. In fact, many countries consider LED lamps a strategic product due to their superior energy efficiency in comparison with other lighting apparatuses.
LED production consists of three processes: Epi thin film deposition, chip process, and packaging. GaN MO CVD is necessary equipment for forming the Epi thin film, which is the core technology in the line.
JUSUNG’s GaN MO CVD equipment is used in the mass production of green, blue, and white colored LED lamps. It has excellent endurance in the heat process above 1,200°C for the formation of the Ga, In, and Al nitrides in LED lamps and displays superior productivity compared to those of competitors.
Semiconductor Equipment
[ Cyclone Plus™ - SD CVD(Al203, Hf02, Zr02, TiN, Ru, TiTiN, TiAIN, HfSiO) Equipment ]
SDCVD (Space divided CVD-ALD) is one of the most advanced and promising thin film technologies. Thanks to its superior film qualities including impurity-free film, excellent step coverage, good uniformity and lower process temperature, SDCVD is expected to soon replace conventional thin film technologies such as CVD and PVD.
JUSUNG’s development strategy is to advance hardware concepts to meet the requirements of micro device makers. One of the unique hardware concepts is the single-wafer type, which is suitable for very thin film deposition and integration with other thin film processes.
Another new concept is the semi-batch type, which is appropriate for thick film deposition and stand-alone processes. JUSUNG’s system guarantees the highest throughput with excellent film quality.
1. CYCLONE PLUS™ System
The most significant disadvantage of ALD is low throughput. To maximize the throughput of ALD, JUSUNG has developed an innovative semi-batch type system with a five-wafer batch size. In addition, a rotating injector has been developed to cover a larger deposition area. The technical advantages of rotating injectors are good uniformity of gas distribution, higher deposition rate, and minimization of valve control. JUSUNG’s CYCLONE PLUSTM system guarantees to deliver the world’s highest throughput.
2. EUREKA™ System
JUSUNG has developed EUREKA™, a single wafer system with a unique injector and reactor. The injector is located in the center of the top lid (the “top injector”), and its structure is very simple compared to the shower head type. Due to the injector’s small volume, it takes a relatively short time to purge the source and reactant.
The reactor structure is also much simpler than that of the laminar flow type ALD system. Therefore, this single wafer system guarantees easy maintenance, high reliability and repeatability. Another important advantage of this system is that it performs both pure and pseudo ALD processes, while the shower head and laminar flow types can only perform either the pseudo or pure process.
[ Genaon™ - Dry Etcher(Poly Etch) Equipment ]
In an etching process, the micro patterns printed on the wafers by photo-resist or hardmask are formed by removing the substrate with plasma. JUSUNG’s Dry Etcher is applicable to any process including poly and metal processes.
The system is implemented with the ICP (Inductive Coupled Plasma) generator based on the unique 27.12MHz Parallel Resonance Double Stack Antenna technology to cope with the defects of serial antenna, minimizing wafer damage. Its W Hard Mask (SiN) selection ratio is superior to competitors’ systems by more than 50% and is a candidate for the next generation W-bit line & W-gate etcher.
In addition, the Dry Etcher is designed to be compatible for both 200mm and 300mm wafers to minimize footprint, and has a minimized number of consumable parts for improved aintainability, cost reduction, and stable productivity in mass production lines. Its performance has been fully proven to many customers.
[ MO CVD(Ta205, BST, Ru) Equipment ]
The MO CVD process forms films on a desired substance by treating metal organic compound with high vapor pressure onto the heated substrate in the process chamber. The core points of the MO CVD process are smoothing out of the metal organic compound and process reproducibility.
JUSUNG’s MO CVD equipment provides excellent constitution, large-area film uniformity, high deposition rate and uniform deposition due to the chamber structure and the LDS that was developed with its patented technology. The equipment is widely used in semiconductor process lines for diverse applications such as high dielectric films and metal films, such as Ta2O5, BST, HfO2, Al2O3, and Ru, which are a core part of the semiconductor process.
Due to its unique technical power, JUSUNG offers the highest-class integration solutions for MO CVD, as required by current semiconductor devices.
● Jusung Engineering Co., Ltd.
49, Neungpyeong-ri, Opo-eup, Gwangju, Gyeonggi-do, Korea
Tel: (82-31)760-7000
Fax: (82-31)760-7070
E-mail: bongjo.kim@jusung.com / misskorea@mprvision.com
Website: www.jseng.com
|
Other Articles
