SEHWA
Excellent Gas Solution
[Excellent Gas Solution]
•Patent application 10-2011-0097441 : Standard gas mixing device
•Patent registration No. 10-1192818 :Gas mixing control device
•Patent registration No. 10-11176878 : Gas mixing device
•Trademark application 40-2012-0068003 Gasplus
•Trademark application 40-2012-0068005 Mixtime
Advantages
Easy Operation
1. Inlet gas flow rate setting per each channels
2. Easy adjustment of the desired mixing ratio
- Freely adjustable in a mixing range of 0.1% to 100%
High Process Reliability
1. Real-time setting of mixing ratio is available
2. Mandatory mixing is available through static mixer regardless of flow rate
Constant Mixture Quality
1. Regular maintenance of mixing status is available regardless of inlet gas
2. Clean and easy maintenance through employing all sus