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The demand for digital electronics devices is increasing in the global markets. In response to this global trend, OCI Materials, a leading professional producer of specialty gases for semiconductors, TFTLCDs and solar cells, has already strategically
increased its production capacity of specialty gases through larger expansion.
A specialty gas called “NF3”from the company is used for cleaning the CVD Chamber and etching the vapor deposition layer during the production process for semiconductors, insulating and/or conductive layer which is made on the surface of a wafer in a CVD Chamber.
Different kinds of gases are pumped into the chamber and can create a chemical reaction to make a layer on the surface of the wafer. Many different residuals are left on the surface of the boards or inner side of the chamber. Thus, NF3 is injected and applied to the area to start a chemical reaction and cleaning process in order to remove remnants in the CVD Chamber.
OCI Materials is currently boosting its efforts to discover huge new overseas markets such as Taiwan, Japan, and China. Its other specialty model WF6 is a toxic, corrosive non-flammable liquid, used in Tungsten silicide chemical vapor deposition to create a conductive film.
WF6 is an excellent material for contact plugging which is used to increase the speed of this process or to link elements in the semiconductor production process.
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